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Hōʻike ʻenehana lapaʻau ʻili polishing electrolytic —— ʻO ka hopena hope loa no ka ʻili maʻemaʻe loa o ke kila kila

I. Nā Hana a me nā Waiwai Koʻikoʻi

Nā hana koʻikoʻi

  • Maʻemaʻe loa: ʻilikai Ra ≤ 0.1μm (papa aniani), e hōʻemi ana i ka hoʻopili ʻana o ka microbial ma o 90%+
  • Hoʻomaikaʻi i ke kūpaʻa ʻana i ka pala: ua mānoanoa ʻia ka ʻili passivation e 3 manawa, a ʻoi aku ka nui o ka hoʻāʻo ʻana o ka paʻakai 1000 hola (5-8 mau manawa ʻoi aku ka kiʻekiʻe ma mua o ke kumu mua)
  • Ka hoʻokaʻawale ʻana a me ke kūlike ʻana: ka hoʻoheheʻe koho ʻana o nā protrusions microscopic e hoʻokō ai i ka laumania piha o nā lua paʻakikī
  • Palekana papa lapaʻau: hoʻopau i nā ʻāpana hao i hoʻokomo ʻia ma luna o ka ʻili a pale i ka haumia o ka ion metala

Ka hoʻoponopono pilikia koʻikoʻi

Nā pilikia o ka ʻoihana Nā hopena wili uila
Ka ulu ʻana o ka bacteria i loko o ka pipeline lāʻau lapaʻau ʻO ka ʻili pahee loa o Ra0.08μm e kāohi ana i ka biofilm
Ka haumia metala i nā lako semiconductor Wehe i ka papa kīnā 5-20μm o ka ʻili
ʻAʻole like ke ʻano o ka polishing mechanical ua hoʻohālikelike ʻia ka ʻili holoʻokoʻa me ke ʻano electrochemical

II. Kumu Hana

ʻO ke ʻano pālua o ka hoʻoheheʻe ʻana o ka anodic a me ke kūkulu hou ʻana o ka kiʻiʻoniʻoni passivation

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Ke kaʻina hana hoʻohālikelike microscopic:

① Hoʻoheheʻe ʻia nā ion i hoʻoheheʻe ʻia → ② ua hoʻokumu ʻia ka papa viscous o ka electrolyte → ③ ua pale ʻia ke kaumaha e ka ʻili passivation → ④ ke ʻano o ka ʻili e like me ka pae atomika

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Kiʻi: ʻO ke ʻano hana hoʻoheheʻe koho pimple microscopic a me ka passivation film (nānā ʻana o SEM)

III. Ke kaʻina hana hana

Nā ʻanuʻu hoʻomalu pololei

  1. Lapaʻau mua
    • Hoʻopau ʻaila alkaline (60℃× 10min) → hoʻomaʻemaʻe ultrasonic → holoi wai maʻemaʻe
  2. Hoʻopili uila
    • ʻElekolita: 65% waikawa phosphoric + 15% waikawa sulfuric + 20% glycerol (60-80℃)
    • Nā palena: uila 12-18V, ka nui o ke au 20-50A/dm², manawa 5-15min
    • Mea Hana: ʻO ka cathode hīnaʻi titanium he 100-150mm ka mamao mai ka workpiece
  3. Ma hope o ka mālama ʻana
    • ʻEkolu holoi kahe hope → ultrasonication wai maʻemaʻe → hoʻomaloʻo naikokene
  4. Nā kūlana hoʻomalu maikaʻi
    • ʻOʻoleʻa: Ra ≤ 0.1μm ʻike ʻia e ka interferometer mālamalama keʻokeʻo
    • Ke kūpaʻa ʻana i ka palaho: Hoʻāʻo pīpī paʻakai acetic acid wikiwiki i ka paʻakai keleawe (CASS) ≥48h me ka ʻole o ka hoʻololi ʻana

IV. Hoʻohālikelike me nā kaʻina hana ʻē aʻe

ʻAno Hoʻopili uila Ka wili ʻana i ka mīkini Ka wili kemika
ʻO ka ʻōʻili Ra 0.02-0.1μm (hoʻopau aniani) Ra 0.1-0.4μm (ʻano) Ra 0.2-0.5μm (ʻili ʻalani)
Hoʻomaikaʻi ʻia ke kūpaʻa ʻana i ka pala ★★★★★ (Hoʻomānoanoa ʻana o ka ʻili passivation) ★★☆☆☆ (Haumia komo) ★★★☆☆ (ʻAʻole like ka pala)
Ka hana ʻana i ka hoʻonohonoho paʻakikī Ka uhi piha ʻana o ka lua o loko/nā microholes Hiki ke komo ma ka ʻili o waho wale nō ʻAʻole paʻa ka hohonu o ka lua
Ka ninini ʻana o nā mea Wehe pololei 5-20μm 10-100μm abrasive wear Hoʻoheheʻe ʻana o Anisotropic o 20-50μm
Ka palekana o ke kaiapuni ʻO ka nui o ka hoʻōla ʻana o ka waikawa ʻōpala he>85% Ka haumia o ka lepo Nā hoʻokuʻu ʻana o ka naikokene oxide
Kumukūʻai mua ¥150-300/㎡ ¥80-150/㎡ ¥50-100/㎡

Nā hōʻike empirical o ka ʻoihana lapaʻau:

Ka poli ʻana i nā mea hana ʻoki kino me ka electrolytic:

  • Koena o ka bacteria: (ka wili ʻana i ka mīkini> 200 CFU/cm²)
  • Ua pōkole ʻia ka manawa hoʻomaʻemaʻe a me ka disinfection e 40%

V. Alakaʻi Hana Noi

• Nā wahi hiki ʻole ke pani ʻia:

  • ✅ Nā lako hana lāʻau lapaʻau (paipu hoʻoheheʻe wai/paipu hoʻomaloʻo hau)
  • ✅ ʻŌnaehana wai maʻemaʻe kiʻekiʻe loa (ka lua hana semiconductor/paipu kinoea)
  • ✅ Nā mea lapaʻau hiki ke hoʻokomo ʻia (nā wili orthopedic/nā stents cardiovascular)

• Nā koho ʻē aʻe no ka hoʻokele waiwai:

  • ❌ Nā ʻāpana hoʻonaninani maʻamau (ka wili ʻana i ka mīkini i manaʻo ʻia)
  • ❌ Nā ʻāpana kūkulu nui (kumukūʻai kiʻekiʻe)

Hopena: Hoʻokō ka poli ʻana electrolytic i nā holomua pālua i ka hana a me ka palekana no ke kila kila ma o ka hoʻohālikelike ʻana o ka ʻili atomika i hui pū ʻia me ke kūkulu hou ʻana o ka kiʻi passivation. ʻO Mingli Metal Lumi maʻemaʻe papa 1000 hiki ke hana i nā ʻāpana micro-porous me nā diameters Φ3mm, ka hoʻokō ʻana i ka nui o ka oxygen ma luna (XPS analysis) e hoʻokō ana i nā kūlana ASME BPE a me FDA cGMP, e hāʻawi ana i nā hoʻonā ʻili maʻemaʻe loa no nā ʻoihana kiʻekiʻe.

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Pākuʻi: Hoʻohālikelike o ka hopena poli electrolytic

Kiʻi: Hoʻohālikelike o ka ʻili liʻiliʻi a me ke kūpaʻa ʻana i ka palaho ma waena o ka polishing mechanical (hema) a me ka polishing electrolytic (ʻākau)

• Pākuʻi loea

  1. Ka loiloi ʻana o ka hoʻonohonoho ʻana o ka membrane (ʻike ʻana iā XPS):
    • Ka nui o ka Cr₂O₃: 75-85% (ka wili ʻana i ka mīkini he 40-60 wale nō%)
    • Laki Fe/Cr: ≤0.1 (koi papa lapaʻau ≤0.3)
  2. Nā palena palena:
    • Ka pololei o ka hana ʻana: Ra 0.008μm (pae silicon monocrystalline)
    • Ka hana ʻana i ka puka liʻiliʻi loa: Φ 0.5mm ka hohonu o ka lua (lakio lōʻihi-a-ke anawaena 10:1)
  3. Kaʻina hana hou:
    • Ka hoʻowali electrolytic pulse: e hōʻemi i ka pohō waiwai ma o 30%
    • Kōkua plasma mahana haʻahaʻa: hoʻemi ʻia ka hoʻohana ʻana i ka ikehu e 40%